真空条件下で所定の温度まで400 K / hで昇温し2 h保持した(多

真空条件下で所定の温度まで400 K / hで昇温し2 h保持した(多孔質Niに処理する場合は1 h保持した)。

ผลลัพธ์ (อังกฤษ) 1:

Under vacuum conditions up to temperature place 400 temperature increases in K/h and 2 h holding (handling of porous Ni you hold 1 h).

ผลลัพธ์ (อังกฤษ) 2:

In raising to a predetermined temperature 400 K / h in vacuo was heated 2 h hold (when processing the porous Ni was kept 1 h).

ผลลัพธ์ (อังกฤษ) 3:

In vacuum condition to a predetermined temperature, the temperature of the K 400 H 2 h to be held in the porous Ni holds 1 h